Abstract:Abstract Nanoimprint lithography (NIL) has been utilized to address the manufacturing challenges of high cost and low throughput for optical metasurfaces. To overcome the limitations inherent in conventional imprint resins characterized by a low refractive index ( n ), high- n nanocomposites have been introduced to directly serve as meta-atoms. However, comprehensive research on these nanocomposites is notably lacking. In this study, we focus on the composition of high- n zirconium dioxide (ZrO 2 ) nanoparticle (NP) concentration and solvents used to produce ultraviolet (UV) metaholograms and quantify the transfer fidelity by the measured conversion efficiency. The utilization of 80 wt% ZrO 2 NPs in MIBK, MEK, and acetone results in conversion efficiencies of 62.3%, 51.4%, and 61.5%, respectively, at a wavelength of 325 nm. The analysis of the solvent composition and NP concentration can further enhance the manufacturing capabilities of high- n nanocomposites in NIL, enabling potential practical use of optical metasurfaces.

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to fabricate high - refractive - index nanocomposites in the process of nanoimprint lithography (NIL) in order to improve the conversion efficiency and pattern transfer fidelity of ultraviolet (UV) metasurfaces. Specifically, the research focuses on optimizing the composition of nanocomposites by adjusting the concentration of zirconia (ZrO₂) nanoparticles (NPs) and the selection of solvents, so as to achieve the fabrication of high - fidelity UV metaholograms. ### Main problems 1. **Low conversion efficiency**: Due to the relatively low refractive index (about 1.5) of traditional imprint resins, the conversion efficiency of metasurfaces is not high. 2. **Pattern transfer fidelity**: When using high - refractive - index nanocomposites for nanoimprinting, how to ensure high - fidelity pattern transfer is a challenge. 3. **Influence of solvent selection**: Different solvents have different effects on polydimethylsiloxane (PDMS) soft molds. How to select an appropriate solvent to reduce the swelling of soft molds and thus improve the fidelity of pattern transfer. ### Solutions 1. **Optimizing nanoparticle concentration**: The research found that a ZrO₂ nanoparticle concentration of 80 wt% is the optimal condition, which can achieve both high refractive index and high pattern transfer fidelity simultaneously. 2. **Selecting an appropriate solvent**: By comparing the effects of different solvents (such as MIBK, MEK, acetone, toluene and n - hexane) on PDMS soft molds, it was found that acetone is an ideal solvent, which can achieve high - pattern - transfer fidelity while maintaining a low swelling ratio. 3. **Experimental verification**: The effectiveness of the above - optimized conditions was verified by experimentally measuring the conversion efficiency of UV metaholograms prepared under different solvent conditions. The results showed that the nanocomposites using MIBK and acetone as solvents achieved conversion efficiencies of 62.3% and 61.5% respectively, while the conversion efficiency of the nanocomposite using MEK as a solvent was only 51.4%. ### Conclusion This research has successfully improved the conversion efficiency and pattern - transfer fidelity of UV metaholograms by optimizing the composition of ZrO₂ nanocomposites and solvent selection. These achievements not only provide an important reference for the application of high - refractive - index nanocomposites in nanoimprint lithography, but also lay the foundation for the future development of optical metasurface manufacturing technology.

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