8′′ wafer-scale, centimeter-sized, high-efficiency metalenses in the ultraviolet

Joohoon Kim,Yeseul Kim,Wonjoong Kim,Dong Kyo Oh,Dohyun Kang,Junhwa Seong,Jeong Woo Shin,Dohyun Go,Chanwoong Park,Hyoin Song,Jihwan An,Heon Lee,Junsuk Rho
DOI: https://doi.org/10.1016/j.mattod.2024.01.010
IF: 24.2
2024-02-25
Materials Today
Abstract:Metalenses have outstanding light-modulating performances, and studies have been conducted on them to not only replace conventional bulky and heavy refractive lenses but also to expand on them. However, their operating wavelengths have rarely covered the ultraviolet (UV) regime since UV-transparent materials are scarce and nanopatterning techniques have a small patterning area, high cost, and low throughput. These limitations are overcome in this study, and centimeter-scale and highly efficient UV metalenses are successfully mass-produced. The UV metalens is designed to operate at a wavelength of 325 nm, with a numerical aperture of 0.2. Argon fluoride photolithography is used to fabricate an 8-inch master stamp in which 300 metalenses are patterned in an array with a high resolution. The fabricated master stamp can be duplicated repeatedly using wafer-scale nanoimprint lithography. To improve efficiency, we developed a zirconium dioxide–polymer hybrid material that is scalable, easily manufacturable, UV-transparent, and high-index material. The experimental results confirm that the mass-produced metalenses operate as ideal imaging systems, exhibiting an average measured efficiency of 45.1 %.
materials science, multidisciplinary
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