Fabrication and Characterization of Silicon-Based Antimonene Thin Film via Electron Beam Evaporation

Tingting Zhong,Lina Zeng,Junfeng Yang,Yichao Shu,Li Sun,Zaijin Li,Hao Chen,Guojun Liu,Zhongliang Qiao,Yi Qu,Dongxin Xu,Lianhe Li,Lin Li
DOI: https://doi.org/10.3390/ma17051090
IF: 3.4
2024-02-28
Materials
Abstract:Antimonene has attracted much attention due to its excellent characteristics of high carrier mobility, thermoelectric properties and high stability. It has great application prospects in Q-switched lasers, laser protection and spintronics. At present, the epitaxy growth of antimonene mainly depends on molecular beam epitaxy. We have successfully prepared antimonene films on silicon, germanium/silicon substrates for the first time using electron beam evaporation coating and studied the effects of the deposition rate and substrate on the preparation of antimonene; film characterization was performed via confocal microprobe Raman spectroscopy, via X-ray diffraction and using a scanning electron microscope. Raman spectroscopy showed that different deposition rates can lead to the formation of different structures of antimonene, such as α phase and β phase. At the same time, it was found that the growth of antimonene is also affected by different substrates and ion beams.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,metallurgy & metallurgical engineering
What problem does this paper attempt to address?