Properties of Black Silicon Layers Fabricated by Different Techniques for Solar Cell Applications

Gagik Ayvazyan,Karen Ayvazyan,Levon Hakhoyan,Xiaolong Liu
DOI: https://doi.org/10.1002/pssr.202300410
2023-11-22
physica status solidi (RRL) - Rapid Research Letters
Abstract:Black silicon (BS) layers coated with passivation films are widely used as antireflective frontal surfaces for solar cells. The most common BS fabrication techniques are reactive ion etching (RIE), metal‐assisted chemical etching, and laser‐induced processing. Here, we compared the structural and optical properties, as well as the minority carrier lifetime, of BS with and without atomic layer deposited HfO2 passivation films produced by the above formation methods. The antireflection behavior of the samples was discussed based on the light trapping effect and the change in the BS refractive index from air to the bulk of crystalline Si. Finally, test solar cells were manufactured, and their photovoltaic parameters were studied. The comparison results show that RIE was the most preferred in all technical respects. The features of using different BS fabrication techniques from the solar cell manufacturing point of view are analyzed. This article is protected by copyright. All rights reserved.
physics, condensed matter, applied,materials science, multidisciplinary
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