Selective Antisite Defect Formation in WS 2 Monolayers via Reactive Growth on Dilute W‐Au Alloy Substrates (Adv. Mater. 3/2022)

Kai Wang,Lizhi Zhang,Giang D. Nguyen,Xiahan Sang,Chenze Liu,Yiling Yu,Wonhee Ko,Raymond R. Unocic,Alexander A. Puretzky,Christopher M. Rouleau,David B. Geohegan,Lei Fu,Gerd Duscher,An‐Ping Li,Mina Yoon,Kai Xiao
DOI: https://doi.org/10.1002/adma.202270024
IF: 29.4
2022-01-01
Advanced Materials
Abstract:2D Materials In article number 2106674, Kai Xiao and co‐workers develop a nonequilibrium chemical vapor deposition approach for selective formation of antisite defects in atomically thin 2D tungsten sulfide monolayer crystals by regulating the diffusion of tungsten into gold substrates. This work demonstrates a novel strategy for the selective formation of defects in 2D materials by tuning their formation energy during synthesis via choice of substrate and alloy design.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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