Unraveling the Mechanism of Remote Scavenging Effect at the InP/Al 2 O 3 Interface Induced by Titanium Layer

Ze Feng,Yong Sun,Yuandong Sun,Xiao Chen,Yang Shen,Rong Huang,Zhiyun Li,Hu Wang,Ding Ding,Yue Peng,Yitong Wang,Meiyi Jing,Feng Lu,Weihua Wang,Yahui Cheng,Yi Cui,An Dingsun,Genquan Han,Hui Liu,Hong Dong
DOI: https://doi.org/10.1002/admi.202101238
IF: 5.4
2021-12-16
Advanced Materials Interfaces
Abstract:Low interface oxide concentration is desired for III‐V semiconductor/high k dielectrics stacks to get high‐performance devices. The remote scavenging effect is observed upon Ti metal deposition on the InP/Al2O3 system, characterized by in situ angle resolved X‐ray photoelectron spectroscopy and time‐of‐flight secondary ion mass spectrometry, as well as ex situ cross‐sectional transmission electron microscopy. The mechanism is investigated by O18 tracing. Two mechanisms are proposed for this remote scavenging effect. The impact of this remote scavenging effect is studied by metal oxide semiconductor (MOS) capacitors fabrication and characterization. This work sheds light on InP‐based MOS devices. Whether the remote scavenging effect (RSE) occurs at the InP/Al2O3 stacks by deposition of titanium metal layer has been investigated. Two approaches are possibly responsible for this RSE. One is a cascade process of oxygen transfer. The other is the diffused titanium atoms reacting with the In/P‐oxides directly. The RSE is beneficial to lower the density of interface traps.
materials science, multidisciplinary,chemistry
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