Abstract:The effect of plasma activation of reactive gas on the process of reactive magnetron synthesis of oxide coatings was theoretically and experimentally investigated using a radio-frequency inductively coupled plasma source, which creates a flow of activated reactive gas directed towards the surface on which the oxide coating is deposited. The reactive gas passes through a dense inductively coupled plasma located inside the plasma source, while argon is supplied through a separate channel near the magnetron. A theoretical model has been built allowing the calculation of spatial distributions of fluxes of metal atoms and molecules of activated reaction gas, as well as the stoichiometry area of the synthesized coatings. Calculations were performed on the example of aluminum oxide. It was found that the plasma activation of the reactive gas allows to increase the sticking coefficient of oxygen to the surface of the growing coating from values less than 0.1 for non-activated molecular oxygen to 0.9 when 500 W of RF power is introduced into the inductive discharge. In order to verify the developed model, experiments were conducted on depositing an aluminum oxide film on glass substrates located at different distances from the magnetron target, followed by measuring the distribution of film transparency along the substrate length and comparing it with the calculated distribution. A comparison of the calculation results with the experimental data shows a good agreement in the entire studied range of parameters. Based on the generalization of the obtained results, an empirical rule was formulated that the power ratio of the magnetron discharge and the plasma activator should be approximately 8:1.

Model of Reactive Magnetron Sputtering of a Two-Component Composite Target

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Towards a more complete model for reactive magnetron sputtering

Modeling for Calculation of Vanadium Oxide Film Composition in Reactive-Sputtering Process

Modelling and Optimization for Deposition of SiO X N Y Films by Radio-Frequency Reactive Sputtering

Analysis Of Titanium And Vanadium Oxide Thin Film By Method Of Reactive Co-Sputtering

Simulation of Ti Target Characteristics in TiO2 Film Growth by Medium Frequency Reactive Magnetron Sputtering

Performance of a Planar Magnetron Sputtering Apparatus with Complex Targets

Discharge and Deposition Characteristics of High-Power Impulse Magnetron Sputtering Using Various Target Materials

Melting/Oxidation Behavior of In-Flight Particles in Plasma Spray Processes

Predicting Thin Film Stoichiometry in V-O-2 Reactive Sputtering

Monte Carlo Simulation of Deposition Uniformity in the Triple-Target Magnetron Co-Sputtering System

Reactive magnetron sputtering of thin films: present status and trends

The Effect of Plasma Activation of Reactive Gas in Reactive Magnetron Sputtering

Study of Atomic Sputtering and Transport Dynamics by Monte Carlo Simulation

Modeling for V—O 2 Reactive Sputtering Process Using a Pulsed Power Supply

Modeling the Reactive Sputter Deposition of Ti-doped VO X Thin Films

Experimental and Simulation Study of Magnetron Sputtering MgO Film Thickness Distribution

Deposition of the stoichiometric coatings by reactive magnetron sputtering

Study of Heat Flow at Substrate during Sputtering of Copper-Titanium Sandwich Target