Comparison of parameter variation of InAs quantum dots embedded in GaAs/Al0.30Ga0.70As structures with different capping/buffer quantum wells at annealing

R. Cisneros Tamayo,T. V. Torchynska,G. Polupan,A. Stintz
DOI: https://doi.org/10.1007/s10854-023-10374-1
2023-05-12
Abstract:The emission variation with annealing in GaAs/Al 0.30 Ga 0.70 As structures with quantum dots of InAs (QDs) located in different capping/buffer wells (QWs) is investigated. Two types of QD structures are compared: (i) Al 0.10 Ga 0.75 In 0.15 As capping and Ga 0.85 In 0.15 As buffer (#1) and (ii) Al 0.40 Ga 0.45 In 0.15 As capping and Ga 0.75 In 0.25 As buffer (#2) layers. QD structures were annealed at 640 °C or 710 °C for 2 hours in an argon atmosphere for estimation of their application temperature ranges. To reveal the variation of the QD and capping/buffer QW compositions, the investigations of QD emission and X-ray diffraction of high-resolution (HR-XRD) have been used. Furthermore, HR-XRD scans were modeled by numerical simulation with X'Pert Epitaxy software. The variation of the QD emission peaks against temperatures in the range of 10-400 K was also studied, allowing QD compositions to be monitored. The advantages of the studied QD structures have been compared and discussed in detail.
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied
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