Effect of Applied Voltage on Localized Deposition of Silicon Dioxide-like Films on Stainless Steel Using Atmospheric Pressure Microplasma Jet

Wang, Tao
DOI: https://doi.org/10.1007/s11090-023-10332-z
2023-04-29
Plasma Chemistry and Plasma Processing
Abstract:Atmospheric pressure plasma jet (APPJ) is a promising method for thin film deposition. In this work, an argon/oxygen/hexamethyldisiloxane APPJ is utilized to deposit SiO 2 -like thin film on a stainless steel surface, and then the optical, electrical, thermal, and particle properties of this APPJ are investigated by adjusting the applied voltage. Moreover, the surface morphology, thickness, roughness, element composition, and water contact angle properties of the deposited thin films are also studied. The results show that there are two filaments discharge states of the APPJ by increasing voltage, which are partial filaments discharge (PFD) state at 5.4 kV and uniform filaments discharge (UFD) state at 7.5 kV. The current pulses and plasma gas temperature in the UFD state are higher than in the PFD state. The dissipated power increases from 7.2 to 19.1 W with the applied voltage increases. And OH, O, and Si active particles are monitored in two discharge states of APPJ. Besides, the surface morphology of the deposited thin films is different in the two discharge states and the film thickness is 1.21 ± 0.19 μm and 1.55 ± 0.35 μm respectively. The XPS results show that the film is a SiO 2 -like film in which the Si/O ratio is 2.80 and 2.76 and contains three kinds of Si–O bonds and a high concentration of carbon (47% and 53%). Finally, the SiO 2 -like films deposited on the surface of stainless steel at two discharge states are hydrophobic and the water contact angles are 76.8° ± 5° and 90.3° ± 3° respectively. This work is helpful in the deposition of high-quality silicon-containing films on conductive substrates by APPJ.
engineering, chemical,physics, fluids & plasmas, applied
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