Temperature-dependent analysis of heterojunction-free GaN FinFET through optimization of controlling gate parameters and dielectric materials

Ajay Kumar,Amit Kumar Goyal
DOI: https://doi.org/10.1515/ijmr-2021-8668
2023-04-15
International Journal of Materials Research
Abstract:This work presents the temperature-dependent analysis of heterojunction-free gallium nitride (GaN) FinFET through optimization of controlling gate parameters and dielectric materials. The temperature-dependent performance evaluation presents in terms of the transfer characteristic, transconductance, subthreshold swing (SS), and drain-induced barrier lowering (DIBL). Further, parametric assessment has been performed by gate length (L g ) and oxide thickness (t ox ) variation for optimization. Moreover, the different gate dielectric materials (Al 2 O 3 , ZrO 2, and Si 3 N 4 ) have also been used for different temperatures to optimize suitable gate dielectric material for improved performance of the device. Thus, GAN FinFET can be considered a promising component in high temperatures in IC and RF amplifiers.
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