Optimum resistive switching characteristics of NiFe2O4 by controlling film thickness

Sheng-Kai Tong,Ji-Hong Chang,Yong-Han Hao,Ming-Ru Wu,Da-Hua Wei,Yu-Lun Chueh
DOI: https://doi.org/10.1016/j.apsusc.2021.150091
IF: 6.7
2021-10-01
Applied Surface Science
Abstract:In this work, a simple and effective method with different thicknesses in the ranges of 100–300 nm of insulating layer was investigated to enhance the performance of resistive switching behavior in polymetallic oxide-based spinel nickel ferrite (NiFe2O4) resistive switching memristor. The Pt/NiFe2O4/Pt capacitor-like device with an optimum 200 nm thick insulating layer has been found to operate at room temperature in unipolar resistive switching (URS) mode and with narrow distribution and less fluctuation on endurance property, and then switches the highly distinguishable (ON/OFF ratio >100 times), reversible and reproducible between the ON and OFF states. The Pt/NiFe2O4/Pt symmetric layered structure using a designed 200 nm insulating layer without any further post-deposition annealing demonstrates higher stability without any inter-overlap signal between high resistive state (HRS) and low resistive state (LRS) transition. The optimum characteristic in NiFe2O4 operating control is without any abnormal resistive switching behavior. Such a designed insulating layer with critical thickness plays a key role to enhance the comprehensive performance of the switching behavior, which could be a simple and effective method with a high successful rate of fabrication for requirements of industrial technology. This work could provide a solid foundation in multi-functional devices and make a stepping forward to the universal memristor with an extremely low-temperature process in the future.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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