Evaluation of photocatalytic activity, water contact angle, and annealing for TiO2 thin films deposited with mixed WOX–SiO2 thin films using radiofrequency sputtering

Tomoaki Miyagi,Yoshiro Takahashi,Yasuki Akimoto

DOI: https://doi.org/10.1063/5.0132929

IF: 2.877

2023-02-08

Journal of Applied Physics

Abstract:A mixture of hydrophilic silicon dioxide (SiO 2 ) and visible-light-reactive tungsten oxide (WO X ) has the potential to improve the photocatalytic activity of conventional titanium dioxide (TiO 2 ). This study deposits mixed WO X –SiO 2 thin films on TiO 2 surfaces by controlling the composition of WO X :SiO 2 using radiofrequency sputtering to improve photocatalytic activity and hydrophilicity. The photocatalytic activity is evaluated via the degradation of a methylene blue solution, and hydrophilicity is measured using the water contact angle. In addition, the effect of annealing is determined at 400 °C after deposition. The optical bandgap decreases as the composition of WO X increases and subsequently anneals. The XRD measurements show that polycrystalline monoclinic WO 3 peaks appear after annealing when the composition of the mixed WO X –SiO 2 thin films only consists of WO X . In contrast, monoclinic WO 3 (200) appears after adding SiO 2 . Atomic force microscopy images show that the grain size decreases as the SiO 2 content increases. Moreover, the photocatalytic activity of the mixed WO X –SiO 2 thin films improves after annealing. In particular, the mixed WO X –SiO 2 thin films that are deposited at a sputter power of WO X :SiO 2 = 100:50 W demonstrate a remarkable improvement in photocatalytic activity. Furthermore, the water contact angle of the mixed WO X –SiO 2 thin films decreases as the SiO 2 content increases and after annealing. This proposed approach can be used for high-performance photocatalytic materials and be widely applied for the fabrication of various semiconducting devices.

physics, applied