Effect of Carrier Transport Process on Tunneling Electroresistance in Ferroelectric Tunnel Junction

Ryun-Han Koo,Wonjun Shin,Kyung Kyu Min,Dongseok Kwon,Dae Hwan Kim,Jae-Joon Kim,Daewoong Kwon,Jong-Ho Lee
DOI: https://doi.org/10.1109/led.2022.3223340
IF: 4.8157
2022-12-31
IEEE Electron Device Letters
Abstract:We demonstrate the factors that determine the tunneling electroresistance (TER) of the ferroelectric tunnel junction (FTJ) by investigating the effects of temperature ( ) and the number of cycles ( on remnant polarization ( and carrier transport process. The fabricated FTJs have a metal/ferroelectric/insulator/semiconductor structure. The is increased with increasing and due to oxygen vacancy redistribution. However, the increased in a higher and does not improve the TER ratio. Using current-voltage characterization and low-frequency noise spectroscopy, we reveal that the carrier transport process at the interface between the ferroelectric and dielectric layers becomes more important than in determining the TER ratio.
engineering, electrical & electronic
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