Performance study of double SOI image sensors

T. Miyoshi,Y. Arai,Y. Fujita,R. Hamasaki,K. Hara,Y. Ikegami,I. Kurachi,R. Nishimura,S. Ono,K. Tauchi,T. Tsuboyama,M. Yamada
DOI: https://doi.org/10.1088/1748-0221/13/02/C02005
2019-10-03
Journal of Instrumentation
Abstract:Double silicon-on-insulator (DSOI) sensors composed of two thin silicon layers and one thick silicon layer have been developed since 2011. The thick substrate consists of high resistivity silicon with p-n junctions while the thin layers are used as SOI-CMOS circuitry and as shielding to reduce the back-gate effect and crosstalk between the sensor and the circuitry. In 2014, a high-resolution integration-type pixel sensor, INTPIX8, was developed based on the DSOI concept. This device is fabricated using a Czochralski p-type (Cz-p) substrate in contrast to a single SOI (SSOI) device having a single thin silicon layer and a Float Zone p-type (FZ-p) substrate. In the present work, X-ray spectra of both DSOI and SSOI sensors were obtained using an Am-241 radiation source at four gain settings. The gain of the DSOI sensor was found to be approximately three times that of the SSOI device because the coupling capacitance is reduced by the DSOI structure. An X-...
instruments & instrumentation
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