Abstract:High power impulse magnetron sputtering (HiPIMS) is a popular physical vapor deposition (PVD) technology because of the high ionization of the sputtering materials, large coating density, good adhesion, and other favorable properties. However, this technique suffers some disadvantages such as the small deposition rate induced by the high target potential, the metallic droplets produced by the unstable discharge, and different ionizations for different sputtering materials, thereby hampering wider acceptance by the industry. A cylindric HiPIMS source in which the discharge is restricted in the cylinder is described in this paper. By using this source, coatings can be deposited with 100% ions without metallic droplets arising from the unstable discharge, and the unionized sputtered atoms cannot be extracted by the extraction grid with negative potential. Electron oscillation and repetitive sputtering of the unionized atoms occur in the cylinder to enhance collision and ionization. Due to the enlarged discharge area by the cylinder internal surface comparing with the area of the ion outlet (end face of the cylinder), the sputtering ions converge from the inwall to the center of the cylinder target and form an enhanced flow to spray out from the source, which will improve the deposition rate. The structure and discharge characteristics of the novel HiPIMS source are investigated by simulation and experiments. Our results indicate that 8 magnets can provide the reasonable magnetic field and the highest target utilization rate. The distributions of electrons and ions in the target each consist of 8 petals in the optimized magnetic structure, and the highest plasma density happens near the target, which is above 1.31017 m-3. The discharge characteristics confirm that the cylindric sputtering source can be operated under HiPIMS conditions and the evolution of the target currents with target voltage exhibits I-V characteristics typical of HiPIMS. An obvious pre-ionization is observed on the discharge glow and discharge current curves when the extra direct current (DC) is added. The racetrack area is about 60.0% of the target surface. The ion current curves are similar to those of the target currents, but a 40 s delay and about one-tenth current value are observed compared with the target currents. The sputtering is improved by the extra DC, inducing the increased metallic ions and the opposite evolution of gas ions. The results suggest that the cylindric sputtering source can be effectively used to conduct HiPIMS and is a novel way to improve and promote the application of HiPIMS.

On density distribution of Ti atom and ion ground states near the target in HiPIMS discharge using Cavity Ring-Down Spectroscopy and Laser Induced Fluorescence

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Ionized particle transport in reactive HiPIMS discharge: correlation between the energy distribution functions of neutral and ionized atoms

Cylindric High Power Impulse Magnetron Sputtering Source and Its Discharge Characteristics

Steady state discharge optimization in high-power impulse magnetron sputtering through the control of the magnetic field

Nano-second temporal particle behavior in high-power impulse magnetron sputtering discharge in a cylindrical cathode

Production of High-Power Nitrogen Sputtering Plasma for TiN Film Preparation

Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

Azimuthal ion movement in HiPIMS plasmas -- Part II: lateral growth fluxes

Azimuthal ion movement in HiPIMS plasmas -- Part I: velocity distribution function

Magnetic Field Optimization and High-Power Discharge Characteristics of Cylindrical Sputtering Cathode

Discharge and Deposition Characteristics of High-Power Impulse Magnetron Sputtering Using Various Target Materials

Effects of the dynamic cathode sheath on electron transport at the initial period of HiPIMS pulse studied by Langmuir probe measurements and 2D PIC-MCC simulation

High-power impulse magnetron sputter deposition of TiB x thin films: Effects of pulse length and peak current density

High power fast pulsed magnetron discharges

Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering

Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO 2 deposition process drifts.