Abstract:HiPIMS plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these ions is still an open issue, which is unraveled by using two fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\mu$s and phase resolved optical emission spectroscopy with a temporal resolution of 1 $\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^{+}$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^+$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, which can be monitored by oscillations in the IV-characteristics in the MHz range that are picked up by the used VI-probes. These oscillations are correlated with the spokes phenomenon and are explained as an amplification of the Hall current inside the spokes as hot ionization zones. To explain the presence of energetic ions, we propose a double layer (DL) confining the hot plasma inside a spoke: if an atom becomes ionized inside the spokes region it is accelerated because of the DL to higher energies whereas its energy remains unchanged if it is ionized outside. In applying this DL model to our measurements the observed phenomena as well as several measurements from other groups can be explained. Only if spokes and a double layer are present the confined particles can gain enough energy to leave the magnetic trap. We conclude from our findings that the spoke phenomenon represents the essence of HiPIMS plasmas, explaining their good performance for material synthesis applications.

Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO 2 deposition process drifts.

Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO$_2$ deposition process drifts

Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride

Ionized particle transport in reactive HiPIMS discharge: correlation between the energy distribution functions of neutral and ionized atoms

On density distribution of Ti atom and ion ground states near the target in HiPIMS discharge using Cavity Ring-Down Spectroscopy and Laser Induced Fluorescence

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Using optical emission spectroscopy in atmospheric conditions to track the inflight reduction of plasma sprayed TiO2−x feedstock for thermoelectric applications

Structural and Optical Properties of RF-biased PECVD TiO2 Thin Films Deposited in an O2/TTIP Helicon Reactor

Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

TEM Analysis of Photocatalytic TiO2 Thin Films Deposited on Polymer Substrates by Low-Temperature ICP-PECVD

Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Effect of the pulse frequency on the structure, mechanical and tribological properties of Ti-Al-Ta-N coatings deposited by HiPIMS

Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride

Energy-efficient Physical Vapor Deposition of Dense and Hard Ti-Al-W-N Coatings Deposited under Industrial Conditions

High-power impulse magnetron sputter deposition of TiB x thin films: Effects of pulse length and peak current density

Effects of Input Power Ratio of AlCr/Ti Target on the Microstructural and Mechanical Properties of AlTiCrN Coatings Synthesized by a High-Power Impulse Magnetron Sputtering Process

Low Temperature Deposition of Functional Thin Films on Insulating Substrates: Selective Ion Acceleration using Synchronized Floating Potential HiPIMS

Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O$_2$ radiofrequency plasma used for polymer surface treatment

Reactive remote plasma sputtering of TiOx thin films and controlled growth of textured single-phase rutile using rf substrate biasing

Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfOxNy) Thin Films