Abstract:In high power impulse magnetron sputtering (HiPIMS) discharge, the cathode sheath is a particularly vital section which determines the spatial distribution of electric field and the energy and transport of charged particles. In this work, a single Langmuir probe is employed to explore the effects of dynamic cathode sheath on electron transport at the initial period of HiPIMS pulse. Measurements show that the electron temperature is as high as ~20 eV and the plasma density is much lower than ~1015–1016 m−3 at the beginning of HiPIMS pulse t < 3 μs; correspondingly, a feature of small low-energy amplitude and extended high-energy tail is found in the electron energy distribution function (EEDF). And the high-energy electrons can escape the magnetic trap and gradually diffuse to further axial positions, even to z = 140 mm with only several microseconds delay. The diffusion coefficient of electrons D⊥ is larger than the typical Bohm diffusion at z > 32 mm in our discharge case. The two-dimension Particle-in-cell Monte Carlo collision (2D PIC-MCC) simulation results are well in agreement with the experimental results. The net positive charge density ∆n near the target is lower than ~+9.2×1014 m−3 at t = 0.5 μs, and the charge separation is up to ~0.4. In this case, the cathode sheath has a large thickness and the axial electric field EZ outside the sheath is as strong as dozens of 10 kVm−1. The simulation results confirm, for the case of the expanding sheath, (i) the electrons can be accelerated and escape the magnetic trap with weak constraint; (ii) the electron group can maintain their kinetic energy when they diffuse from the ionization region (IR) to bulk plasma (BP). When the net charge density increases to ~+3×1016 m−3 at t = 2.5 μs, the sheath thickness is condensed to ~1 mm with ~600 V voltage drop.

Ionized particle transport in reactive HiPIMS discharge: correlation between the energy distribution functions of neutral and ionized atoms

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

On density distribution of Ti atom and ion ground states near the target in HiPIMS discharge using Cavity Ring-Down Spectroscopy and Laser Induced Fluorescence

Azimuthal ion movement in HiPIMS plasmas -- Part I: velocity distribution function

Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

Nano-second temporal particle behavior in high-power impulse magnetron sputtering discharge in a cylindrical cathode

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Azimuthal ion movement in HiPIMS plasmas -- Part II: lateral growth fluxes

Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO 2 deposition process drifts.

Impact of self-sputtering in high power impulse magnetron sputtering (HiPIMS) with helium

Effects of the dynamic cathode sheath on electron transport at the initial period of HiPIMS pulse studied by Langmuir probe measurements and 2D PIC-MCC simulation

Discharge Characteristics of Novel Dual-Pulse HiPIMS and Deposition of CrN Films with High Deposition Rate

Use of an energetic ion beam on the surface during physical vapor deposition

Production of High-Power Nitrogen Sputtering Plasma for TiN Film Preparation

Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO$_2$ deposition process drifts

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Ionized Physical Vapor Deposition of Titanium Nitride: Plasma and Film Characterization

Effect of Synthesis Conditions on Discharge Behavior of Magnetic Field Enhanced High Power Impulse Magnetron Sputtering

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)