Effects of the dynamic cathode sheath on electron transport at the initial period of HiPIMS pulse studied by Langmuir probe measurements and 2D PIC-MCC simulation

Mingyue Han,Yang Luo,Hua Li,Ye Xu,Sida Luo,Hao Xu,Changyun Xu,LiuHe Li

DOI: https://doi.org/10.1016/j.surfcoat.2020.126371

IF: 4.865

2020-12-01

Surface and Coatings Technology

Abstract:<p>In high power impulse magnetron sputtering (HiPIMS) discharge, the cathode sheath is a particularly vital section which determines the spatial distribution of electric field and the energy and transport of charged particles. In this work, a single Langmuir probe is employed to explore the effects of dynamic cathode sheath on electron transport at the initial period of HiPIMS pulse. Measurements show that the electron temperature is as high as ~20 eV and the plasma density is much lower than ~10¹⁵–10¹⁶ m⁻³ at the beginning of HiPIMS pulse <em>t</em> &lt; 3 μs; correspondingly, a feature of small low-energy amplitude and extended high-energy tail is found in the electron energy distribution function (EEDF). And the high-energy electrons can escape the magnetic trap and gradually diffuse to further axial positions, even to <em>z</em> = 140 mm with only several microseconds delay. The diffusion coefficient of electrons <em>D</em>_⊥ is larger than the typical Bohm diffusion at <em>z</em> &gt; 32 mm in our discharge case. The two-dimension Particle-in-cell Monte Carlo collision (2D PIC-MCC) simulation results are well in agreement with the experimental results. The net positive charge density <em>∆n</em> near the target is lower than ~+9.2×10¹⁴ m⁻³ at <em>t</em> = 0.5 μs, and the charge separation is up to ~0.4. In this case, the cathode sheath has a large thickness and the axial electric field <em>E</em>_<em>Z</em> outside the sheath is as strong as dozens of 10 kVm⁻¹. The simulation results confirm, for the case of the expanding sheath, (i) the electrons can be accelerated and escape the magnetic trap with weak constraint; (ii) the electron group can maintain their kinetic energy when they diffuse from the ionization region (IR) to bulk plasma (BP). When the net charge density increases to ~+3×10¹⁶ m⁻³ at <em>t</em> = 2.5 μs, the sheath thickness is condensed to ~1 mm with ~600 V voltage drop.</p>

physics, applied,materials science, coatings & films

What problem does this paper attempt to address?

The problem that this paper attempts to solve is the influence of the dynamic cathode sheath on electron transport during the high - power impulse magnetron sputtering (HiPIMS) discharge process. Specifically, the study focuses on how the dynamic cathode sheath affects the electron temperature, energy distribution, and diffusion coefficient in the initial stage of the HiPIMS pulse. Through experimental measurements and 2D PIC - MCC simulations, the authors explore the following key points:

1. **Changes in electron temperature and plasma density**: Within the first few microseconds of the HiPIMS pulse, the electron temperature can reach approximately 20 eV, while the plasma density is much lower than \(10^{15}-10^{16}\, \text{m}^{-3}\). This indicates that in the early stage of the pulse, the plasma is in a low - density but high - energy state.

2. **Characteristics of the electron energy distribution function (EEDF)**: The experimental results show that in the electron energy distribution function, there is a low - energy peak and an extended high - energy tail. This means that in the early stage of the pulse, there are a large number of high - energy electrons, which can escape from the magnetic field trap and gradually diffuse to more distant positions, even reaching \(z = 140\, \text{mm}\).

3. **Electron diffusion coefficient**: In the case of \(z>32\, \text{mm}\), the transverse diffusion coefficient \(D_{\perp}\) of electrons is greater than the typical Bohm diffusion coefficient. This indicates that during the HiPIMS discharge process, electrons diffuse more rapidly.

4. **Net positive charge density and electric field distribution**: The simulation results show that the net positive charge density \(\Delta n\) near the target is lower than \(9.2\times 10^{14}\, \text{m}^{-3}\) at \(t = 0.5\,\mu\text{s}\), and the charge separation degree can reach 0.4. At the same time, the thickness of the cathode sheath is relatively large, and the axial electric field \(E_Z\) can be as high as tens of kV/m outside the sheath.

5. **Sheath establishment process**: As the net charge density increases, the sheath thickness is compressed from a few millimeters to approximately 1 millimeter, and the voltage drop also increases from a few hundred volts to about 600 volts. This indicates that during the HiPIMS discharge process, the dynamic changes of the sheath have a significant impact on plasma parameters and particle transport.

Through these studies, the authors aim to gain an in - depth understanding of the formation mechanism of the dynamic cathode sheath during the HiPIMS discharge process and its influence on electron transport, thereby providing a theoretical basis for optimizing the HiPIMS process.