A computational study on the effect of minor yttrium on the interfacial adherence of Al oxide film to aluminum substrate

Lei Li,D Y Li,Dongyang Li
DOI: https://doi.org/10.1088/1361-648X/ab1864
2019-10-07
Abstract:It is well documented that minor rare-earth can improve interfacial adherence of oxide films to passive metallic substrates. However, such benefit vanishes when the amount of rare-earth increases. The mechanism for such a change has never been well clarified. This article reports our ab initio calculations to investigate the role that yttrium plays in promoting the interfacial adherence of Al oxide film to Al substrate. Influences of Y 3+ -ions on Al 2 O 3 /Al interfacial bonding, strength of Y-doped Al 2 O 3 layer and that of Y-contained Al substrate were analyzed. Efforts are made to elucidate the beneficial effect of minor yttrium on the interfacial bonding and how an opposite effect is caused as the amount of yttrium increases.
physics, condensed matter
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