Abstract:The new EUV Lithography tools for IC High Volume Manufacture at 22nm make use of EUV radiation at \lambda = 13.5nm. High power Laser (LPP) and Discharge (DPP)EUV light sources are based on Sn plasmas for the optimum conversion of electrical power to in-band radiation. Sn-fueled sources emit debris such as Sn particles in a rather wide energy spectrum: from thermalized Sn to several tens keV fast ions. Tin interaction with the collector mirrors surfaces facing the high power EUV light source leads to the degradation of the optical performance and productivity of the litho tool, therefore debris must be suppressed and the surface modification of the mirror materials during the particle irradiation must be carefully investigated both theoretically and experimentally. For DPP Sn-fueled sources the collector is a grazing incidence mirror that reflects the EUV light in the grazing angle range from about 1\degree to 20\degree. The most used material for these collector mirrors is Ru. The knowledge of the interaction process of Sn particles at different energies and angles with Ru mirrors is crucial to understand mirror degradation and to tune the parameters of the source and of the debris suppression devices to reach optimal mirror lifetime. We carried out a study of the modification of the ruthenium surface exposed to the simultaneous flux of thermalized and energetic Sn at grazing incidence, for energies varying from 300eV to 30keV. The computational study is performed with the Monte Carlo codes TRIDYN and TRIM.SP based on binary collision approximation assumptions. These tools allow to follow dynamically and at steady state the evolution of the surface composition and to model surface binding energy and density for predicting sputtering, reflection, ion-assisted deposition and depth profiles in the nm surface region.

Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source

In-situ non-destructive removal of tin particles by low-energy plasma for imitation of EUV optical mirrors self-cleaning

Investigation of electrode-driven hydrogen plasma method for in situ cleaning of tin-based contamination

Absolute density measurement of hydrogen radicals in XUV induced plasma for tin contamination cleaning via laser-induced fluorescence

Cryogenic cleaning of tin-drop contamination on surfaces relevant for extreme ultraviolet light collection

In situ transformation and cleaning of tin-drop contamination on mirrors for extreme ultraviolet light

Miniature Plasma Source for In-Situ Scanner Cleaning

EUV Debris Mitigation using Magnetic Nulls

Efficient photo-dissociation-induced production of hydrogen radicals using vacuum ultraviolet light from a laser-produced plasma

Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source

The impact of hydrogen plasma on the structure and morphology of tin and lead micrometer sized particles

Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 extmu m-wavelength laser for future EUV lithography

Elastic scattering cross sections and transport of tin ions in extreme ultraviolet lithography sources

Physics of laser-driven tin plasma sources of EUV radiation for nanolithography

Grazing incidence interaction of Sn particles with EUV Lithography ruthenium mirrors

Sticking behavior and transformation of tin droplets on silicon wafers and multilayer-coated mirrors

Diagnostics of tin droplet-based laser produced plasma by triple Langmuir probe

Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

Fuzz Nanostructure and Erosion on Tungsten–vanadium Alloys Exposed to Helium Plasma in the STEP Linear Plasma Device

Non-contact removal of 60-nm latex particles from silicon wafers with laser-induced plasma

Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests