Titanium dioxide/silicon hole-blocking selective contact to enable double-heterojunction crystalline silicon-based solar cell

Ken A. Nagamatsu,Sushobhan Avasthi,Girija Sahasrabudhe,Gabriel Man,Janam Jhaveri,Alexander H. Berg,Jeffrey Schwartz,Antoine Kahn,Sigurd Wagner,James C. Sturm
DOI: https://doi.org/10.1063/1.4916540
IF: 4
2015-03-23
Applied Physics Letters
Abstract:In this work, we use an electron-selective titanium dioxide (TiO2) heterojunction contact to silicon to block minority carrier holes in the silicon from recombining at the cathode contact of a silicon-based photovoltaic device. We present four pieces of evidence demonstrating the beneficial effect of adding the TiO2 hole-blocking layer: reduced dark current, increased open circuit voltage (VOC), increased quantum efficiency at longer wavelengths, and increased stored minority carrier charge under forward bias. The importance of a low rate of recombination of minority carriers at the Si/TiO2 interface for effective blocking of minority carriers is quantitatively described. The anode is made of a poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) heterojunction to silicon which forms a hole selective contact, so that the entire device is made at a maximum temperature of 100 °C, with no doping gradients or junctions in the silicon. A low rate of recombination of minority carriers at the Si/TiO2 interface is crucial for effective blocking of minority carriers. Such a pair of complementary carrier-selective heterojunctions offers a path towards high-efficiency silicon solar cells using relatively simple and near-room temperature fabrication techniques.
physics, applied
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