The strategy of precursors entering furnace for graphene synthesis through the CVD technique

Najmeh Koosha,Javad Karimi-Sabet,Mohammad Ali Moosavian,Younes Amini,Abolfazl Dastbaz

DOI: https://doi.org/10.1007/s41127-021-00046-4

2022-01-23

Graphene and 2D Materials

Abstract:Chemical vapor deposition (CVD) is one of the best methods to grow graphene. In this way, there are many methods to produce graphene by liquid and solid precursor. In this research, we grew the graphene using ethanol and cyclohexane as precursors by some of these methods to obtain the best method to enter the precursor to the furnace. We compare the size of graphene domains by these methods and investigate the quality of their products. As the best method, we should keep inert gas into the precursor container to dilute the vapor of the precursor and heat the container to be sure that there is the vapor of precursor in it. Hydrogen should flow from a separate pipeline to the furnace. In this method, the rate of carbon precursor is measurable. Also, the results show that by increasing the growth time, graphene domains grow and become more significant. Also, with increasing the number of carbons in the structure of the precursor, the size of graphene will increase.