Abstract:The integrity and cleanliness of graphene film is the core of graphene devices. However, the cleanliness and integrity of the graphene film can only be ensured when the transferred film area is small (less than 2╳2 cm 2 ), which leads to the extremely low preparation efficiency of graphene devices and limits its industrialization applications. But, the integrity and cleanliness of the graphene film will decrease with the increase of the transfer film area. Therefore, the clean and intact transfer of large area graphene films is extremely difficult, which limits the performance and development of graphene electronic devices. Hence, a wafer-scale(6-inch), intact and clean transfer method (Surface tension traction method) of chemical vapor deposition (CVD) copper-based monolayer, multilayer graphene and single crystals graphene are proposed, which is suitable for various target substrate (rigid substrate, such as:SiO 2 /Si, GaN, glass etc. or flexible substrate, such as PI, PET, PEN, etc.). The use of the watch glass ensures that the graphene film is not directly contacted with the transfer medium (slides, glass or silicon wafers) when the film is transferred between various solutions. And the surface tension of the water can ensure that the graphene is spread on the water surface, which minimizing the probability of graphene breakage, wrinkles and contamination. This also directly greatly reduces the residue of the PMMA layer. The average of 62500 spots of Raman spectrum peak intensity ratios (I D /I G ) is only 0.02318, The average hole mobility of GFETs prepared from graphene transferred can reach 3438 ± 84 cm 2 /Vs, which reveals the outstanding quality and uniformity of graphene transferred. The graphene transferred is expected to be applied in the fields of transparent, conductive electrodes, flexible films, electronic devices, heat dissipation and anti-corrosion, etc, to promote the industrial production of CVD graphene films.

Roll‐to‐Roll Dry Transfer of Large‐Scale Graphene

Roll-to-Roll Mechanical Peeling for Dry Transfer of Chemical Vapor Deposition Graphene

Transfer of Cvd-Grown Monolayer Graphene Onto Arbitrary Substrates

Selective Mechanical Transfer of Graphene from Seed Copper Foil Using Rate Effects

Transfer Printing of CVD Graphene FETs on Patterned Substrates

Dry transfer method for suspended graphene on lift-off-resist: simple ballistic devices with Fabry-Pérot interference

A review on high throughput roll-to-roll manufacturing of chemical vapor deposition graphene

Large-Scale Production Of Graphene Nanoribbons From Electrospun Polymers

Surface tension traction transfer method for wafer-scale device grade graphene film

Clean transfer of graphene for isolation and suspension

Roll-to-roll continuous patterning and transfer of graphene via dispersive adhesion

Transfer of Large-Area Graphene Films for High-Performance Transparent Conductive Electrodes

Rapid and Scalable Transfer of Large‐area Graphene Wafers

Transfer of graphene onto arbitrary substrates via sublimable carrier

Toward Clean and Crackless Transfer of Graphene

Clean and Efficient Transfer of CVD-grown Graphene by Electrochemical Etching of Metal Substrate

Assessment of wafer-level transfer techniques of graphene with respect to semiconductor industry requirements

A Scalable Polymer-Free Method for Transferring Graphene Onto Arbitrary Surfaces

Direct Growth of Graphene Nanoribbons for Large-Scale Device Fabrication

Dry transfer of CVD graphene using MoS$_2$-based stamps

Roll-to-roll Production of 30-Inch Graphene Films for Transparent Electrodes