Abstract:Graphene offers exceptional properties, such as ultra-high carrier mobility, near-ballistic transport characteristics, and ultra-high-frequency operational response, making it an ideal material for radio-frequency devices and high-speed optical communications. To realize its potential applications, high-quality graphene films must be integrated onto target substrates with reliability, uniformity, and scalability. Despite significant progress in the chemical vapor deposition of high-quality graphene on catalytic metal substrates, the transfer of such films onto application-targeted substrates remains necessary for large-scale technological use, but it faces challenges like contaminations and cracks. Graphene's flexibility and single-atom thickness make it vulnerable to damage and folding during the transfer process due to force disturbances and uneven force distribution. Traditional graphene transfer methods employ organic polymers as a medium and remove them using organic solvents after transferring graphene onto the desired substrates. However, this repetitive process generates organic waste and leaves unavoidable contamination due to the limited solubility of the polymer. Furthermore, selective interlacing of organic solvents during polymer removal can detach graphene from the substrate and cause cracks. In this study, we demonstrate a novel approach to address these issues. Instead of using organic polymers, we directly use the photoresist as the transfer medium to mechanically delaminate graphene from the metal growth substrate onto the targeted substrate. By doing so, we eliminate the need for repeated polymer coating on the graphene surface, enabling successful transfer without crack formation, wrinkles, or unintentional doping. The strong interaction between graphene and the photoresist, coupled with the weakened interaction between graphene and the growth substrate due to oxidation, ensures crack-free delamination. Moreover, the photoresist serves as a patterned mask plate for exposure, etching, and other subsequent device fabrication processes. As a result, the electrical properties of graphene are improved, achieving an average carrier mobility of 6200 cm(2)center dot V-1 center dot s(-1). This integrated approach not only enhances the device performance of two-dimensional materials but also paves the way for future applications of such materials in electronics and photonics. In conclusion, our method offers a promising solution for the successful transfer and device fabrication of graphene, enhancing its potential in the field of electronics and photonics.

Clean and Efficient Transfer of CVD-grown Graphene by Electrochemical Etching of Metal Substrate

Toward Clean and Crackless Transfer of Graphene

High-quality Graphene Transfer Via Directional Etching of Metal Substrates.

Graphene Transfer: Paving the Road for Applications of Chemical Vapor Deposition Graphene

Ultraclean Transfer of Graphene by Mechanically Exfoliating Polymer with Modified Crosslink Density

Rapid and Scalable Transfer of Large‐area Graphene Wafers

Clean transfer of graphene for isolation and suspension

Modified RCA clean transfer of graphene and all-carbon electronic devices fabrication

The Effects of the Transfer Process on the Quality of CVD-grown Graphene

Electrochemical Delamination of Cvd-Grown Graphene Film: Toward the Recyclable Use of Copper Catalyst

Ice‐Enabled Transfer of Graphene on Copper Substrates Enhanced by Electric Field and Cu2O

Direct Formation of Wafer-Scale Single-Layer Graphene Films on the Rough Surface Substrate by PECVD

Crack-Free Transfer of Graphene Wafers Via Photoresist As Transfer Medium

Transfer Printing of CVD Graphene FETs on Patterned Substrates

A Scalable Polymer-Free Method for Transferring Graphene Onto Arbitrary Surfaces

Transfer of Cvd-Grown Monolayer Graphene Onto Arbitrary Substrates

The role of Cu crystallographic orientations towards growing superclean graphene on meter-sized scale

Surface tension traction transfer method for wafer-scale device grade graphene film

Laminar Flow-Assisted Metal Etching for the Preparation of High-Quality Transfer-Free Graphene

Scalable production of electrochemically exfoliated graphene by an extensible electrochemical reactor with encapsulated anode and dual cathodes

Recent Advances in Transfer‐Free Synthesis of High‐Quality Graphene