Self-adaptive phosphor coating technology for wafer-level scale chip packaging

Linsong Zhou,Haibo Rao,Wei Wang,Xianlong Wan,Junyuan Liao,Xuemei Wang,Da Zhou,Qiaolin Lei
DOI: https://doi.org/10.1088/1674-4926/34/5/054010
2013-05-01
Journal of Semiconductors
Abstract:A new self-adaptive phosphor coating technology has been successfully developed, which adopted a slurry method combined with a self-exposure process. A phosphor suspension in the water-soluble photoresist was applied and exposed to LED blue light itself and developed to form a conformal phosphor coating with self-adaptability to the angular distribution of intensity of blue light and better-performing spatial color uniformity. The self-adaptive phosphor coating technology had been successfully adopted in the wafer surface to realize a wafer-level scale phosphor conformal coating. The first-stage experiments show satisfying results and give an adequate demonstration of the flexibility of self-adaptive coating technology on application of WLSCP.
physics, condensed matter
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