Vapor Phase Deposition Synthesis of Bismuth-Based Topological Insulator Nanoplates and Their Electrostatic Properties

Guolin Hao,Xiang Qi,Jianxin Zhong
DOI: https://doi.org/10.1007/978-1-4614-8121-8_12
2013-01-01
Abstract:Bismuth-based materials have been extensively investigated as the best thermoelectric materials. Recently they were confirmed to be topological insulators promising in future spintronics and topological quantum computation. Using vapor phase deposition method, we have synthesized few-layer topological insulator bismuth telluride, bismuth selenide, and ternary bismuth-based nanoplates with hexagonal, triangular, and truncated triangular nanostructures. The possible formation mechanism of these nanoplates with various nanostructures has been proposed. Electrostatic properties of the as-prepared nanoplates as well as charge injection have been systematically investigated by Kelvin probe force microscopy (KPFM) under ambient environment. We find bismuth-based nanoplates exhibit uniform surface potential and charge distributions. The work functions of topological insulator nanoplates grown on n-doped and p-doped silicon (111) substrates were determined by KPFM. Fermi level tuning of topological insulator nanoplates through substrates and doping were simultaneously investigated. These investigations may provide an effective route to investigate the electronic properties of topological insulators.
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