Pyramid size control and morphology treatment for high-efficiency silicon heterojunction solar cells

Xiaorang Tian,Peide Han,Guanchao Zhao,Rong Yang,Liwei Li,Yuan Meng,Ted Guo
DOI: https://doi.org/10.1088/1674-4926/40/3/032703
2019-03-01
Journal of Semiconductors
Abstract:This paper investigates the formation process of surface pyramid and etching characteristics duringthe texturing process of mono-crystalline silicon wafers. It is found that there is an etch ratetransition point in alkaline anisotropic etching when {100} plane-dominated etch turns to {111}plane-dominated etch, and the pyramid size has a strong linear correlation with the etch amount atthe transition point. Several techniques were developed to control the pyramid size by monitoringand adjusting the etching amount. A wide range of average pyramid sizes were successfully achieved,from 0.5 to 12 μ m. The experiments of the pyramid size on the light reflectance, the minoritycarrier lifetime (MCLT), and the performance of silicon heterojunction (SHJ) solar cells werecarried out and analyzed. A desirable range of pyramid sizes was empirically determined by ourinvestigation. In order to reduce the density states on the texturing surface, the wet-chemicalsmoothing treatme...
physics, condensed matter
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