Abstract:Heat flux sensors (HFSs) are extensively used in combustion-related applications to collect important engineering data. However, most non-water cooling HFSs lack the durability to survive in the harsh, high-temperature environments where they are employed. A new type of thin-film HFS based on a W-5Re/W-26Re thermocouple has been developed for high-temperature heat flux measurement. The sensor consists of 136 pairs of micron-sized W-5Re/W-26Re thin-film thermocouples, an SiO2 thermal-resistance layer, and an AlN substrate. The SiO2 layer is sandwiched between the substrate and thermocouples, and allows the measurement of temperature differences arising from the difference in thermal conductivity between the substrate and the SiO2 layer. A protective layer with a sandwich structure prevents the tungsten-rhenium thin film from oxidizing at high temperatures in air. This small HFS with a protective layer can survive for 1 h in 1000°C air. Calibration data show that the HFS exhibits repeatable and fast thermal responses when a pulsed heat flux of 1000 kW/ $text{m}^{2}$ is applied, and its sensitivity is 3.8* $10^{-6}$ V/(kW/ $text{m}^{2}$ ). The experimental data agree with the simulated results. It can be concluded from the experimental results that the tungsten-rhenium thin film has a good thermoelectric response to high temperatures after the size is reduced to a micron. Thus the developed HFS can be a suitable alternative for applications in thermal systems, such as engines, turbines, and rockets.

Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering

Simulation, Fabrication, and Characteristics of High-Temperature, Quick-Response Tungsten–rhenium Thin-Film Thermocouples Probe Sensor

A Tungsten-Rhenium Thin Film Thermocouples Sensor Based on AlN Transition Layer.

Tungsten-rhenium Thin Film Thermocouples for SiC-based Ceramic Matrix Composites.

Impact of Magnetron Sputtering Parameters on Thermoelectric Properties of Tungsten-Rhenium Thin-Film Thermocouples Sensor

Influences of RF Magnetron Sputtering Power and Gas Flow Rate on a High Conductivity and Low Drift Rate of Tungsten-Rhenium Thin-Film Thermocouples.

Effect of Heat Treatment on Thermoelectric Properties of Tungsten-Rhenium Thin-Film Thermocouples by RF Magnetron Sputtering

A Protected Tungsten-Rhenium Thin Film Thermocouples Sensor

Research on Measurement and Process of Tungsten-Rhenium Thin Film Thermocouples Sensor.

WRe26-In<sub>2</sub>O<sub>3</sub> probe-type thin film thermocouples applied to high temperature measurement

WRe26-In2O3 probe-type thin film thermocouples applied to high temperature measurement.

Horizontal Oxidation Diffusion Behavior of MEMS-Based Tungsten-Rhenium Thin Film Thermocouples

High-Temperature Heat Flux Sensor Based on Tungsten–Rhenium Thin-Film Thermocouple

Mechanical Properties Analysis and Process Optimization for Tungsten-Rhenium Thin Film Thermocouples Sensor.

Fabrication and performance study of high temperature thin film sensor

Enhanced La0.8Sr0.2CrO3/Pt Thin Film Thermocouple with Al2O3 Coating Layer for High Temperature Sensing

Flexible Four-Point Conjugate Thin Film Thermocouples with High Reliability and Sensitivity.

Enhanced Thermoelectric Property and Stability of NiCr–NiSi Thin Film Thermocouple on Superalloy Substrate

Micro temperature sensor chip provided with tungsten rhenium film thermocouple and manufacturing method of chip

Effect of Annealing on the Thermoelectricity Properties of the WRe26-In2O3Thin Film Thermocouples

Effect of Annealing on the Thermoelectricity Properties of the WRe26-In2O3 Thin Film Thermocouples