Potential of High-Purity Polycrystalline Silicon Carbide for Thermistor Applications

EA De Vasconcelos,WY Zhang,H Uchida,T Katsube
DOI: https://doi.org/10.1143/jjap.37.5078
IF: 1.5
1998-01-01
Japanese Journal of Applied Physics
Abstract:This report concerns with a new material for thermistors, which consists of an undoped, polycrystalline, ultrahigh-purity chemical vapor deposition silicon carbide wafer. The resistance-temperature characteristic was measured from 25°C to 365°C. A good fit to the thermistor equation was observed and the thermistor B constant was 4845 K. These wafers are thermally and chemically stable, homogeneous and pure. They might be useful for fabrication of sensitive thermistors with stability and reproducibility of characteristics.
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