Overcoming Redox Reactions at Perovskite-Nickel Oxide Interfaces to Boost Voltages in Perovskite Solar Cells

Caleb C. Boyd,R. Clayton Shallcross,Taylor Moot,Ross Kerner,Luca Bertoluzzi,Arthur Onno,Shalinee Kavadiya,Cullen Chosy,Eli J. Wolf,Jérémie Werner,James A. Raiford,Camila de Paula,Axel F. Palmstrom,Zhengshan J. Yu,Joseph J. Berry,Stacey F. Bent,Zachary C. Holman,Joseph M. Luther,Erin L. Ratcliff,Neal R. Armstrong,Michael D. McGehee
DOI: https://doi.org/10.1016/j.joule.2020.06.004
IF: 46.048
2020-08-01
Joule
Abstract:Nickel oxide (NiO<sub>x</sub>) hole transport layers (HTLs) are desirable contacts for perovskite photovoltaics because they are low cost, stable, and readily scalable; however, they deliver lower open-circuit voltages (<em>V</em><sub>OC</sub>s) compared to organic HTLs. Here, we characterize and mitigate electron transfer-proton transfer reactions between NiO<sub>x</sub> HTLs and perovskite precursors. Using XPS and UPS characterization, we identify that Ni<sup>≥3+</sup> metal cation sites in NiO<sub>x</sub> thin films act both as Brønsted proton acceptors and Lewis electron acceptors, deprotonating cationic amines and oxidizing iodide species, forming PbI<sub>2−x</sub>Br<sub>x</sub>-rich hole extraction barriers at the perovskite-NiO<sub>x</sub> interface. Titrating reactive Ni<sup>≥3+</sup> surface states with excess A-site cation salts during perovskite active layer deposition yielded an increase in <em>V</em><sub>OC</sub> values to 1.15 V and power conversion efficiencies of ∼20%. This may be a general finding for metal oxide contacts that act as Brønsted and Lewis acid-base reactants toward perovskite precursors, an observation that has also been made recently for TiO<sub>2</sub> and SnO<sub>2</sub> contacts.
materials science, multidisciplinary,chemistry, physical,energy & fuels
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