Thin film diamond photodiode for ultraviolet light detection

Michael D. Whitfield,Simon SM Chan,Richard B. Jackman
DOI: https://doi.org/10.1063/1.116062
IF: 4
1996-01-15
Applied Physics Letters
Abstract:A photodiode has been constructed from lightly boron doped, Si supported, thin film chemically vapor deposited (CVD) diamond which shows over five orders of magnitude discrimination between deep UV (≤220 nm) and visible light. A thin (10 nm) gold Schottky barrier with an associated Ti–Ag–Au ohmic contact was used to create a rectifying device with low (≤2 pA) dark currents when reversed biased. This structure showed a sharp cut off in photoresponse at 220 nm, the band gap energy of diamond. Conversely, a photoconductive device fabricated from similar (nominally undoped) material gave a broader UV photoresponse and displayed high dark currents; the superior performance of the diode structure on fine grain material is discussed.
physics, applied
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