Abstract:Thin-layer Al/MgF2 coatings are currently used for extraterrestrial far-UV astronomy as the primary and secondary mirrors of telescopes (such as “Spektr-UF”). Successful Hubble far-UV measurements have been performed thanks to MgF2 on Al mirror coatings. Damage of such thin-layer coatings has been previously studied under exposure to high-energy electrons/protons fluxes and in low Earth orbit environments. Meanwhile, there is an interest to test the stability of such mirrors under the impact of extreme radiation fluxes from pulsed plasma thrusters as a simulation of emergency onboard situations and other applications. In the present studies, the high current and compressed plasma jets were generated by a laboratory plasma thruster prototype and operated as effective emitters of high brightness (with an integral overall wavelength radiation flux of >1 MW/cm2) and broadband radiation. The spectrum rearrangement and hard-photon cut-off at energy above Ec were implemented by selection of a background gas in the discharge chamber. The discharges in air (Ec ≈ 6 eV), argon (Ec ≈ 15 eV) and neon (Ec ≈ 21 eV) were studied. X-ray diffraction and reflectometry, electron and atomic force microscopy, and IR and visible spectroscopy were used for coating characterization and estimation of degradation degree. In the case of the discharges in air with photon energies of E < 6 eV, only individual nanocracks were found and property changes were negligible. In the case of inert gases, the energy fraction was ≈50% in the VUV range. As found for inert background gases, an emission of such hard photons with energies higher than the MgF2 band gap energy of ≈10.8 eV caused a drastic light-induced ablation and degradation of the irradiated coatings. The upward trend of degradation with an increasing of the maximum photon energies was detected. The obtained data on the surface destruction are useful for the design of methods for coating stability tests and an understanding of the consequences of emergencies onboard space research stations.

Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source

EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates

Grazing incidence interaction of Sn particles with EUV Lithography ruthenium mirrors

Microstructure Modulation of Silicon Planted Glass with Low Mirror Reflection

In situ transformation and cleaning of tin-drop contamination on mirrors for extreme ultraviolet light

Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source

Laser damage thresholds of ITER mirror materials and first results on in situ laser cleaning of stainless steel mirrors

Impact of laser-contaminant interaction on the performance of the protective capping layer of 1 ω high-reflection mirror coatings

Surface Degradation of Thin-Layer Al/MgF2 Mirrors under Exposure to Powerful VUV Radiation

Sticking behavior and transformation of tin droplets on silicon wafers and multilayer-coated mirrors

Laser-induced Atomic Oxygen Impacts on Kapton Films and Second Surface Mirror of Kapton/Al

Damage Morphologies of Al2O3 and Fe Particles Attached on the Input Surface of Fused Silica after Irradiation by a 355 Nm Laser.

Cracks growth behaviors of commercial pure titanium under nanosecond laser irradiation for formation of nanostructure-covered microstructures (with sub-5-μm)

Study on the Fabrication Process of X-ray Focusing Mirrors

Scan Speed and Fluence Effects in Femtosecond Laser Induced Micro/nano-Structures on the Surface of Fused Silica

Study of Laser-Irradiated Thin Films

Evolution of Chemical, Structural, and Mechanical Properties of Titanium Nitride Films with Different Thicknesses Fabricated Using Pulsed DC Magnetron Sputtering

Numerical simulation on the damage behaviors of optical mirrors induced by film defects in high-power CW laser

Effect of rapid thermal annealing on the surface properties of the microlens arrays machined on monocrystalline silicon

Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors

Effect of nanosecond laser pre-irradiation on the femtosecond laser-induced damage of Ta2O5/SiO2 high reflector