The fundamentals and applications of ferroelectric HfO2

Uwe Schroeder,Min Hyuk Park,Thomas Mikolajick,Cheol Seong Hwang
DOI: https://doi.org/10.1038/s41578-022-00431-2
IF: 83.5
2022-03-30
Nature Reviews Materials
Abstract:Nature Reviews Materials, Published online: 30 March 2022; doi:10.1038/s41578-022-00431-2Ferroelectric HfO2 and related materials are promising for device applications, given that non-ferroelectric HfO2 is already used for applications at the industrial scale, is CMOS-compatible and is robust to degradation. This Review summarizes the properties and origin of ferroelectricity in HfO2-based materials and surveys their potential applications.
materials science, multidisciplinary,nanoscience & nanotechnology
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