High-resolution stereolithography using a static liquid constrained interface

Aftab A. Bhanvadia,Richard T. Farley,Youngwook Noh,Toshikazu Nishida
DOI: https://doi.org/10.1038/s43246-021-00145-y
2021-04-09
Communications Materials
Abstract:Abstract 3D printing using conventional stereolithography is challenging because the polymerized layers adhere to the solid constraining interface. The mechanical separation forces lead to poor process reliability and limit the geometrical design space of the printed parts. Here, these challenges are overcome by utilizing a static inert immiscible liquid below the resin as the constraining interface. We elucidate the mechanisms that enable the static liquid to mitigate stiction in both discrete layer-by-layer and continuous layerless growth modes. The inert liquid functions as a dewetting interface during the discrete growth and as a carrier of oxygen to inhibit polymerization during the continuous growth. This method enables a wide range of process conditions, such as exposure and resin properties, which facilitates micrometer scale resolutions and dimensional accuracies above 95%. We demonstrate multi-scale microstructures with feature sizes ranging from 16 μm to thousands of micrometers and functional devices with aspect ratios greater than 50:1 without using sacrificial supports. This process can enable additive 3D microfabrication of functional devices for a variety of applications.
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