Some effects of chemical etching on the surface texture of SC-cut and RT-cut quartz plates

C.R. Tellier,F. Jouffroy,C. Buron
DOI: https://doi.org/10.1016/0254-0584(86)90015-5
IF: 4.778
1986-01-01
Materials Chemistry and Physics
Abstract:The kinetics of etching of doubly rotated quartz plates are studied. The Arrhenius plots are found to be linear and values of the apparent activation energy in the range 0.35–0.42 eV are evaluated in accordance with values previously published for singly rotated quartz plates. The evolution of the surface texture of SC and RT quartz plates during the etching with ammonium bifluoride is investigated. The roughness parameters decrease rapidly with increasing depth of etch. This large and rapid decrease seems to correspond to the development of etch patterns all uniformly oriented on the plane surface of resonators. The profilometry traces show directional effects attributed to asymmetrical etch rate distributions which are also typified by the SEM micrographs. Furthermore the distinctive dissolution figures formed on the two sides of RT and SC quartz resonators are characteristic to the crystal orientation which seems to govern the dissolution process.
materials science, multidisciplinary
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