The current–voltage characteristics of V2O5/n-Si Schottky diodes formed with different metals

Meltem Donmez Kaya,Buse Comert Sertel,Nihan Akin Sonmez,Mehmet Cakmak,Suleyman Ozcelik
DOI: https://doi.org/10.1007/s10854-021-06534-w
2021-07-06
Abstract:<p class="a-plus-plus">In this work, we reported the effect of different metal contacts on performance of metal–oxide–semiconductor (MOS)-structured Schottky diodes formed with the vanadium pentoxide thin film (V<sub class="a-plus-plus">2</sub>O<sub class="a-plus-plus">5</sub>) interfacial layer. V<sub class="a-plus-plus">2</sub>O<sub class="a-plus-plus">5</sub> thin films were deposited by radio frequency (RF) magnetron sputtering on n-type silicon (n-Si) and Corning glass (CG) substrates at room temperature. Then, the obtained films were annealed at 300 °C and 500 °C. The effects of annealing temperature on physical properties of the films were investigated by X-ray photoelectron spectroscopy, secondary ion mass spectroscopy, atomic force microscopy, UV–Vis spectroscopy, and photoluminescence. The MOS-structured Al/V<sub class="a-plus-plus">2</sub>O<sub class="a-plus-plus">5</sub>/n-Si, Ti/V<sub class="a-plus-plus">2</sub>O<sub class="a-plus-plus">5</sub>/n-Si and Au/V<sub class="a-plus-plus">2</sub>O<sub class="a-plus-plus">5</sub>/n-Si Schottky barrier diodes (SBDs) performance was analyzed with I–V measurements at room temperature. The Schottky diodes were compared with each other according to three methods (Classic, Norde and Cheung). The experimental results indicated that the Schottky diode produced with Al contact had better performance than the others.</p>
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