Monte Carlo Simulation of Electron Velocity Distribution and Gas Phase Process in Electron-Assisted Chemical Vapor Deposition

Dong Lifang,Ma Boqin,Shang Yong,Wang Zhijun
DOI: https://doi.org/10.1088/1009-0630/7/3/014
2005-06-01
Plasma Science and Technology
Abstract:The gas phase process of diamond film deposition from CH4/H2 gas mixture by electron-assisted chemical vapor deposition is simulated by the Monte-Carlo method. The electron velocity distribution under different E/P (the ratio of the electric field to gas pressure) is obtained, and the velocity profile is asymmetric. The variation of the number density of CH3 and H with different CH4 concentrations and gas pressure is investigated, and the optimal experimental parameters are obtained: The gas pressure is in the range of 2.5 kPa-15 kPa and the CH4 concentration is in the range of 0.5%-1%. The energy carried by the fragment CH3 as the function of the experiment parameters is investigated to explain the diamond growth at low temperature. These results will be helpful to the selection of optimum experimental conditions for high quality diamond films deposition in EACVD and the modeling of plasma chemical vapor deposition.
physics, fluids & plasmas
What problem does this paper attempt to address?