Experimental and Numerical Simulation Study on Uniformity of Temperature and Flow Field in an Advanced Packaging Electroplating Cell

Dongsheng Zhu,Changhong Wang,Xuan Zhou,Shandong Tu
DOI: https://doi.org/10.1109/icept.2007.4441374
2007-08-01
Abstract:An experimental facility of advanced packaging electroplating cell is developed to study the uniformity of the temperature and flow field in the high precision electroplating cell. Based on Heat Transfer and Computational Fluid Dynamics, a 2D numerical model is founded to analyze the temperature field and flow field of the experimental electroplating cell enclosure. Combing with test and simulated results, the effects of the heat source intensity, ventilated mode and heat transfer coefficient on the thermal field of the cell are discussed. Under the condition of natural convection with temperature gradient driving, although heat/cold source intensity and ventilated mode both have effects on the temperature field and flow field of the electroplating enclosure, the heat/cold source is the more marked factor influencing the uniformity of temperature field and flow field. The experimental and simulated results can give a way to enhance the uniformity of the temperature field and flow field and to improve the quantity of the WL-CSP electroplating.
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