Preparation and Photoluminescence of Tungsten Disulfide Monolayer

Yanfei Lv,Feng Huang,Luxi Zhang,Jiaxin Weng,Shichao Zhao,Zhenguo Ji
DOI: https://doi.org/10.3390/coatings8060205
IF: 3.236
2018-05-30
Coatings
Abstract:Tungsten disulfide (WS2) monolayer is a direct band gap semiconductor. The growth of WS2 monolayer hinders the progress of its investigation. In this paper, we prepared the WS2 monolayer through chemical vapor transport deposition. This method makes it easier for the growth of WS2 monolayer through the heterogeneous nucleation-and-growth process. The crystal defects introduced by the heterogeneous nucleation could promote the photoluminescence (PL) emission. We observed the strong photoluminescence emission in the WS2 monolayer, as well as thermal quenching, and the PL energy redshift as the temperature increases. We attribute the thermal quenching to the energy or charge transfer of the excitons. The redshift is related to the dipole moment of WS2.
materials science, multidisciplinary,physics, applied, coatings & films
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