Vertically Standing Graphene: Heater‐Free and Substrate‐Independent Growth of Vertically Standing Graphene Using A High‐Flux Plasma‐Enhanced Chemical Vapor Deposition (Adv. Mater. Interfaces 18/2020)

Zhiheng Wu,Yongshang Zhang,Yonglong Shen,Wei Zhang,Guosheng Shao
DOI: https://doi.org/10.1002/admi.202070100
IF: 5.4
2020-09-01
Advanced Materials Interfaces
Abstract:<p>In article number <a href="https://doi.org/10.1002/admi.202000854">2000854</a>, Yonglong Shen, Guosheng Shao, and co‐workers propose a large‐area deposition of structurally tuned vertically standing graphene (VSG) using a scalable high‐flux plasma enhanced chemical vapor deposition (HPECVD) system. The generated energetic electrons in high‐flux plasma boost the reaction kinetics of the growth process at low substrate temperature, enabling a unique growing mechanism. </p>
materials science, multidisciplinary,chemistry
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