Slim Water Injection Nozzle for Silicon Wafer Wet Cleaning Bath

Hitoshi Habuka,Shogo Okuyama,A. Goto,Kento Miyazaki,N. Ono
DOI: https://doi.org/10.4236/ACES.2016.64035
2016-08-15
Abstract:In order to effectively and quickly clean the surface of semiconductor silicon wafers, the fluid flow is one of the significant issues. For a batch-type silicon wafer wet cleaning bath, a slim water injection nozzle consisting of a dual tube was studied, based on theoretical calculations and experiments. A thin inner tube was placed at the optimum position in the water injection nozzle. Such a simple design could make the water injection direction normal and the water velocity profile symmetrical along the nozzle. The water flow in the wet cleaning bath was observed using a blue- colored ink tracer. When the nozzle developed in this study was placed at the bottom of the bath, a fast and symmetrical upward water stream was formed between and around the wafers.
Materials Science,Engineering,Chemistry
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