Abstract:The properties of sputtered and scattered ions are studied for ion beam sputtering of Si by bombardment with noble gas ions. The energy distributions in dependence on ion beam parameters (ion energy: 0.5–1 keV; ion species: Ne, Ar, Xe) and geometrical parameters (ion incidence angle, polar emission angle, and scattering angle) are measured by means of energy-selective mass spectrometry. The presence of anisotropic effects due to direct sputtering and scattering is discussed and correlated with process parameters. The experimental results are compared to calculations based on a simple elastic binary collision model and to simulations using the Monte-Carlo code sdtrimsp. The influence of the contribution of implanted primary ions on energy distributions of sputtered and scattered particles is studied in simulations. It is found that a 10% variation of the target composition leads to detectable but small differences in the energy distributions of scattered ions. Comparison with previously reported data for other ion/target configurations confirms the presence of similar trends and anisotropic effects: the number of high-energy sputtered ions increases with increasing energy of incident ions and decreasing scattering angle. The effect of the ion/target mass ratio is additionally investigated. Small differences are observed with the change of the primary ion species: the closer the mass ratio to unity, the higher the average energy of sputtered ions. The presence of peaks, assigned to different mechanisms of direct scattering, strongly depends on the ion/target mass ratio.

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Multiple scattering of positively charged particles moving near the (111) plane in a silicon single crystal

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Simulation of Deflection and Photon Emission of Ultra-Relativistic Electrons and Positrons in a Quasi-Mosaic Bent Silicon Crystal

Atomistic modelling of electron propagation and radiation emission in oriented bent ultra-thin Si and Ge crystals

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Reduction of multiple scattering of high-energy positively charged particles during channeling in single crystals

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Thomas Fermi Study on the Planar Channel Fields in Crystals

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Atomistic modeling of the channeling process with account for ionizing collisions: Preliminary results

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Atomistic modelling and characterizaion of light sources based on small-amplitude short-period periodically bent crystals

Experiment on Highly Efficient Deflection of a 1-GeV Proton Beam by a Bent Crystal at the PNPI Synchrocyclotron

Comparison of theory, simulation, and experiment for dynamical extinction of relativistic electron beams diffracted through a si crystal membrane

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Crystal channeling investigations at medical synchrotron regimes

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