Tuning the Optical Anisotropy in Gradient Porous Germanium on Si Substrate

Ying Zhu,Bowen Li,Jiacheng Hu,Guangrui (Maggie) Xia,Rui‐Tao Wen
DOI: https://doi.org/10.1002/adom.202401018
IF: 9
2024-06-26
Advanced Optical Materials
Abstract:When isotropic epitaxial Germanium (Ge) is engineered into porous structure, an anisotropic porous Ge (PGe) layer is obtained. Using effective medium approximation theory, the optical constants are derived from ellipsometric data, showing the optical anisotropy (birefringence) and depolarization factors can be controlled by tuning the porosification parameters. This optical anisotropy in PGe allows applications in sensors and birefringence‐related optical devices. Porous semiconductors have garnered significant attention owing to their distinctive physical and chemical properties. In this study, optical anisotropy is presented in porous germanium (PGe) on a Si (001) substrate. Both n‐ and p‐type PGe, achieved through bipolar electrochemical etching, exhibit optical anisotropy along the Ge direction, as determined by spectroscopic ellipsometry. Birefringence and depolarization factors are controllable by adjusting the etching parameters and doping concentration of the epitaxial Ge layer. The gradient porosity and pore distribution in PGe can be well captured by the optical models. The findings of optical anisotropy in PGe‐on‐Si hold promise for applications in optical elements or sensors for gas or biomolecules.
materials science, multidisciplinary,optics
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