Study of Low Temperature Deposition of Magnetic Sputtering TiN Films and their Tribological Properties

Bai Xiuqin,L. Jian
Abstract:利用磁控溅射装置在高速钢基体上制备了TiN 薄膜,研究了基体温度升高的原因及其磁控溅射的低温原理,讨论了低温与离子刻蚀、负偏压、磁场强度3个主要溅射工艺参数的关系,并对TiN 薄膜的摩擦学性能进行了研究.实验结果表明,离子刻蚀、负偏压、磁场强度对低温磁控溅射TiN成膜过程具有较大的影响,所制备的TiN薄膜的耐磨性、配副适应性也较好.
Physics,Engineering
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