Abstract:A study of the physicochemical modifications at micro and nano scales as a result of femtosecond laser processing is essential to explore the viability of this process to write surface and subsurface structures in transparent media. To this end, scanning probe and transmission electron microscopy and spectroscopy techniques were used to study these modifications in lithium niobate. A variable power Ti:Sapphire system (800nm,300fs) was used to determine the ablation threshold of (110) lithium niobate, and to write these structures in the substrate for subsequent analysis. Higher processing energies were used to amplify the laser-induced effects for a clear understanding. Evidences of a number of simultaneously occurring mechanisms such as melting, ablation, and shockwave propagation are observed in the scanning electron microscope (SEM) micrographs. X-ray diffraction (XRD), Auger and electron dispersive spectroscopy (EDS) studies indicate loss of lithium and oxygen from the immediate surface of the processed region. Raman spectroscopy analysis indicates an unchanged chemical composition in the bulk, though at a loss of crystallinity. The surface and subsurface damage structures display a different nature of the amorphous and damaged material subregions, as observed in the respective transmission electron microscopy micrographs. A variation in oxygen counts is observed in the amorphous subregions, indicative of oxygen liberation and elemental segregation during the process. The oblate subsurface structure contains a void at the top, indicative of localized explosive melting and rapid quenching of the affected material. Thus, femtosecond laser writing produces different structures on the surface and the subsurface of the material. These results provide physicochemical insight towards writing chemically and spatially precise structures using femtosecond lasers, and will have direct implications in optical memory and waveguide writing and related applications.

Reduced material loss caused by Electron Beam Lithography in thin-film lithium niobate through post-process annealing

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Monolithic Integration of a High-Quality Factor Lithium Niobate Microresonator with a Free-Standing Membrane Waveguide Using Femtosecond Laser Assisted Ion Beam Writing (FLAIBW)

Reduced Material Loss in Thin-film Lithium Niobate Waveguides

Nanofabrication of High-Q Thin Film Lithium Niobate Microrings Using Wet Etching

Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching

Raman characterization of focused ion beam fabricated lithium niobate film

Mitigating photorefractive effect in thin-filmlithium niobate microring resonators

Mitigating photorefractive effect in thin-film lithium niobate microring resonators

Recent Progress in Lithium Niobate: Optical Damage, Defect Simulation, and On‐Chip Devices

Integrated Lithium Niobate Microring Resonators Fabricated With 515 nm Femtosecond Laser Ablation

Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

Twenty-nine million Intrinsic Q-factor Monolithic Microresonators on Thin Film Lithium Niobate

Low-loss Lithium Niobate on Insulator (LNOI) Waveguides of a 10 cm-length and a Sub-nanometer Surface Roughness

Er:LiNbO3 Quantum Memory Platform Optimized with Dynamic Defect Annealing

Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform

Investigation of femtosecond laser assisted nano and microscale modifications in lithium niobate

Parasitic conduction loss of lithium niobate on insulator platform

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H$_2$ and SF$_6$ plasmas

LiNbO3 Crystals: from Bulk to Film

Monolithically integrated active passive waveguide array fabricated on thin film lithium niobate using a single continuous photolithography process