Abstract:Lithium niobate (LN) is used in diverse applications such as spectroscopy, remote sensing, and quantum communications. The emergence of lithium-niobate-on-insulator (LNOI) technology and its commercial accessibility represent significant milestones. This technology aids in harnessing the full potential of LN's properties, such as achieving tight mode confinement and strong overlap with applied electric fields, which has enabled LNOI-based electro-optic modulators to have ultra-broad bandwidths with low-voltage operation and low power consumption. Consequently, LNOI devices are emerging as competitive contenders in the integrated photonics landscape. However, the nanofabrication, particularly LN etching, presents a notable challenge. LN is hard, dense, and chemically inert. It has anisotropic etch behavior and a propensity to produce material redeposition during the reactive-ion plasma etch process. These factors make fabricating low-loss LNOI waveguides (WGs) challenging. Recognizing the pivotal role of addressing these fabrication challenges for obtaining low-loss WGs, our research focuses on a systematic study of various process steps in fabricating LNOI WGs and other photonic structures. In particular, our study involves (i) careful selection of hard mask materials, (ii) optimization of inductively coupled plasma etch parameters, and finally, (iii) determining the optimal post-etch cleaning approach to remove redeposited material on the sidewalls of the etched photonic structures. Using the recipe established, we realized optical WGs with total (propagation and coupling) loss value of -10.5 dB, comparable to established values found in the literature. Our findings broaden our understanding of optimizing fabrication processes for low-loss lithium-niobate waveguides and can serve as an accessible resource in advancing LNOI technology.

Reduced Material Loss in Thin-film Lithium Niobate Waveguides

Broadband Highly Efficient Nonlinear Optical Processes in On-Chip Integrated Lithium Niobate Microdisk Resonators of Q-factor above 108

Twenty-nine million Intrinsic Q-factor Monolithic Microresonators on Thin Film Lithium Niobate

Reduced material loss caused by Electron Beam Lithography in thin-film lithium niobate through post-process annealing

Low-loss waveguides on Y-cut thin film lithium niobate: towards acousto-optic applications

High-efficiency Thin-Film Lithium Niobate Modulator with Highly Confined Optical Modes

Ultra-low loss photonic circuits in Lithium Niobate On Insulator

Fabrication of low-loss lithium niobate on insulator waveguides on the wafer scale

Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

SiN-SOI Multilayer Platform for Prospective Applications at 2 Μm

Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching

Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform

Monolithic Ultrahigh-Q Lithium Niobate Microring Resonator

Low-loss Lithium Niobate on Insulator (LNOI) Waveguides of a 10 cm-length and a Sub-nanometer Surface Roughness

Wafer-scale low-loss lithium niobate photonic integrated circuits

Ultralow-loss tightly confining Si3N4 waveguides and high-Q microresonators

Ultralow-Loss Etchless Lithium Niobate Integrated Photonics at Near-Visible Wavelengths

Fabrication of low‐loss symmetrical rib waveguides based on x ‐cut lithium niobate on insulator for integrated quantum photonics

Probing the loss origins of ultra-smooth $\mathrm{Si_3N_4}$ integrated photonic waveguides

High-precision measurement of a propagation loss of low-loss single-mode optical waveguides on lithium niobate on insulator

Ultrahigh-Q lithium niobate microring resonator with multimode waveguide.