Abstract:Lithium niobate (LN) is used in diverse applications such as spectroscopy, remote sensing, and quantum communications. The emergence of lithium-niobate-on-insulator (LNOI) technology and its commercial accessibility represent significant milestones. This technology aids in harnessing the full potential of LN's properties, such as achieving tight mode confinement and strong overlap with applied electric fields, which has enabled LNOI-based electro-optic modulators to have ultra-broad bandwidths with low-voltage operation and low power consumption. Consequently, LNOI devices are emerging as competitive contenders in the integrated photonics landscape. However, the nanofabrication, particularly LN etching, presents a notable challenge. LN is hard, dense, and chemically inert. It has anisotropic etch behavior and a propensity to produce material redeposition during the reactive-ion plasma etch process. These factors make fabricating low-loss LNOI waveguides (WGs) challenging. Recognizing the pivotal role of addressing these fabrication challenges for obtaining low-loss WGs, our research focuses on a systematic study of various process steps in fabricating LNOI WGs and other photonic structures. In particular, our study involves (i) careful selection of hard mask materials, (ii) optimization of inductively coupled plasma etch parameters, and finally, (iii) determining the optimal post-etch cleaning approach to remove redeposited material on the sidewalls of the etched photonic structures. Using the recipe established, we realized optical WGs with total (propagation and coupling) loss value of -10.5 dB, comparable to established values found in the literature. Our findings broaden our understanding of optimizing fabrication processes for low-loss lithium-niobate waveguides and can serve as an accessible resource in advancing LNOI technology.

High-precision measurement of a propagation loss of low-loss single-mode optical waveguides on lithium niobate on insulator

High-precision measurement of a propagation loss of single-mode optical waveguides on lithium niobate on insulator

High-Precision Propagation-Loss Measurement of Single-Mode Optical Waveguides on Lithium Niobate on Insulator

Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

Low-loss Lithium Niobate on Insulator (LNOI) Waveguides of a 10 cm-length and a Sub-nanometer Surface Roughness

High-index-contrast single-mode optical waveguides fabricated on lithium niobate by photolithography assisted chemo-mechanical etching (PLACE)

Fabrication of low-loss lithium niobate on insulator waveguides on the wafer scale

Ultra-low loss photonic circuits in Lithium Niobate On Insulator

Efficient light coupling between an ultra-low loss lithium niobate waveguide and an adiabatically tapered single mode optical fiber

Ultra-Low Loss Lithium Niobate Photonics

Low-loss waveguides on Y-cut thin film lithium niobate: towards acousto-optic applications

Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform

High-efficiency Thin-Film Lithium Niobate Modulator with Highly Confined Optical Modes

Structural optimization of femtosecond-laser-written lithium niobate waveguide by Raman spectroscopy

Ultrabroadband Low-Crosstalk Dense Lithium Niobate Waveguides by Floquet Engineering

Fabrication of Polarization-Independent Single-Mode Waveguides in Lithium Niobate Crystal with Femtosecond Laser Pulses

Fabrication of Ridge Optical Waveguide in Thin Film Lithium Niobate by Proton Exchange and Wet Etching

Lithium niobate ridged waveguides with smooth vertical sidewalls fabricated by an ultra-precision cutting method

Fabrication of low‐loss symmetrical rib waveguides based on x ‐cut lithium niobate on insulator for integrated quantum photonics

High-efficiency and low-loss thin film lithium niobate modulator

Optical-Waveguiding Properties Of Single-Crystal Linbo3 Microwires And Nanowires Synthesized By Hydrothermal Method