Abstract:A Hull cell was used to evaluate a chromium(III) plating bath based on the combination of oxalate and acetate anions. The bath contains chromium(III) sulfate, ammonium oxalate, sodium acetate, boric acid, potassium sulfate, sodium sulfate and sodium dodecyl sulfate (SDS). The working pH was 3.5, and all species were protonated. The chromium(III) plating bath had a faradaic efficiency of 37%, high covering power at 8.2 cm, low deposition potential of 7.3 V, and a deposition rate of 0.4 μm/min. Chromium coatings were obtained at a current density (30A/dm2). This chromium(III) plating bath is competitive considering the state of the art of the electrodeposition of Cr(III). SDS was used as a surfactant to prevent the formation of polymeric oxides (olation reactions) by decreasing the number of nearby ions of Cr(III). Boric acid successfully maintained the pH as a buffer because after 2 h of the electrodeposition process, the pH values change only 0.2 units. The bath was analyzed after electrolysis to check the formation of Cr(VI) ions, and after 2 h of electrodeposition, this cation was not detected. The voltammetry results showed a very high noise with a potential of -0.8 V due to the abundant bubbles that formed and suggest a reduction in a step from Cr(III) to Cr(0). In the literature, the use of oxalate anions is explained by the reaction of exchange of ligands between these anions and the water of the first solvation sphere of Cr(III). In our study, it is postulated that electrostatic interactions of ion-ions and ion-solvents should be very present, and that oxalate and acetate anions are very likely to be in the second sphere of solvation and not in the first as other authors propose. The water molecules in the first solvation sphere are very stable and difficult to replace because they are exposed to two opposite electrostatic forces at their ends.

Local structure of chromium incorporated into electrodeposited nickel hydroxide films.

EIS Investigation of the Deposition of Trivalent Chromium Coatings on Al 6063 Alloy

Monitoring the Formation of Nickel-Poor and Nickel-Rich Oxide Cathode Materials for Lithium-Ion Batteries with Synchrotron Radiation

X‐ray standing wave assisted XANES for depth dependent chemical state analysis of Cr in Cr2O3/Cr bilayer structure

Electrodeposition of Nanocrystalline Chromium Coatings from 1-Butyl-3-methylimidazolium-hydrogen Sulfate Ionic Liquid

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Atomic layer deposition of chromium oxide—An interplay between deposition and etching

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NEXAFS–Spectra and Magnetic Susceptibility of Nickel and Chromium Doped of Bismuth Niobate

Study on the Electrodeposition of Chromium from Cr(III) Solution in the Presence of Oxalate and Acetate Anions

Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture

Investigation of electrochemical dissolution behavior of Ni(γ)/Ni3Al(γ') and Co(γ)/Co3Al(γ') superalloys in NaNO3 solution

Electrodeposition of Ni–Co alloys from a deep eutectic solvent

Electrodeposition and characterization of nanocrystalline CoNiFe films

Exploration of electrodeposited process of Ni-Co-Cr coating and investigation of Cr doping strengthening mechanism by indentation simulation

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Characterization of sputter-deposited hydrophobic chromium doped nickel alumnide coatings for mechanical and high-temperature oxidation-resistant applications

Influence of Ni doping on microstructural, optical and dielectric properties of lanthanum-based chromite

Electrochemical study and structural comparison of Ni electrodepositions on W/Si and Cr/C multilayered structure films

Local structure studies of Ni doped ZnO/PVDF composite free-standing flexible thin films using XPS and EXAFS studies

Electrodeposition of Metal Alloy and Mixed Oxide Films Using a Single‐Precursor Tetranuclear Copper‐Nickel Complex