Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture

Anna Kapran,Rainer Hippler,Harm Wulff,Jiri Olejnicek,Lenka Volfova,Aneta Pisarikova,Natalia Nepomniashchaia,Martin Cada,Zdenek Hubicka
DOI: https://doi.org/10.3390/coatings14030319
IF: 3.236
2024-03-07
Coatings
Abstract:Cobalt nickel oxide films are deposited on Si(111) or fluorine-doped tin-oxide-coated (FTO) glass substrates employing a pulsed hollow-cathode discharge. The hollow cathode is operated with argon gas flowing through the nozzle and with O2 gas admitted to the vacuum chamber. Three different cathode compositions (Co20Ni80, Co50Ni50, and Co80Ni20) are investigated. Deposited and annealed thin films are characterized by X-ray diffraction, infrared (Raman) spectroscopy, and ellipsometry. As-deposited films consist of a single mixed cobalt nickel oxide phase. Upon annealing at 600 °C, the mixed cobalt nickel oxide phase separates into two cystalline sub-phases which consist of cubic NiO and cubic Co3O4. Annealed films are investigated by spectroscopic ellipsometry and the optical bandgaps are determined.
materials science, multidisciplinary,physics, applied, coatings & films
What problem does this paper attempt to address?
This paper aims to study the crystal structure and optical properties of cobalt - nickel oxide films deposited by pulsed hollow cathode (PHC) discharge in a mixture of argon and oxygen gases. Specifically, the paper focuses on the following points: 1. **Film Deposition Method**: Using pulsed hollow cathode discharge technology and cobalt - nickel alloy cathodes with different compositions (Co20Ni80, Co50Ni50 and Co80Ni20), cobalt - nickel oxide films are deposited on Si(111) substrates or fluorine - doped tin oxide (FTO) - coated glass. 2. **Structural Characterization of Films**: The deposited and annealed films are structurally and morphologically characterized by X - ray diffraction (XRD), Raman spectroscopy and ellipsometry. The phase - change processes of the films at different annealing temperatures (410 °C and 600 °C) are studied. 3. **Optical Properties of Films**: The transmittance, refractive index and absorption coefficient of the annealed films are measured by ultraviolet - visible spectroscopy (UV - VIS) and ellipsometry. Special attention is paid to the optical bandgap of the films, and the direct optical bandgap is analyzed by Tauc plots. 4. **Phase - Separation Phenomenon**: The phenomenon of the films separating from a single mixed cobalt - nickel oxide phase into cubic - phase NiO and Co₃O₄ after annealing at 600 °C is studied, and the influence of this process on the optical properties of the films is explored. 5. **Application Prospects**: The potential applications of these films in batteries, supercapacitors, sensors, solar cells and catalysts are explored. ### Main Problems Solved in the Paper 1. **Exploring the Potential of PHC Discharge Technology in Multicomponent Film Deposition**: The application of PHC discharge technology in depositing cobalt - nickel oxide films is studied, especially the influence of cobalt - nickel alloy cathodes with different composition ratios on film properties. 2. **Understanding the Structural Evolution of Films**: The phase - change processes of the films at different annealing temperatures are studied in detail, especially the process of separating from a single phase into NiO and Co₃O₄ two phases after annealing at 600 °C. 3. **Analyzing the Optical Properties of Films**: Through multiple characterization means, the transmittance, refractive index and absorption coefficient of the films are systematically analyzed, the optical bandgap of the films is determined, and the relationship between it and the film composition is explored. 4. **Evaluating the Application Potential of Films**: The photoelectrochemical activity of the films is preliminarily tested. Although no obvious photoelectrochemical activity is observed, basic data are provided for future research. Through the above research, the paper provides important experimental data and theoretical basis for the development of high - performance cobalt - nickel oxide film materials.