Annular Fast Electron Transport in Silicon Arising from Low-Temperature Resistivity.
D. A. Maclellan,D. C. Carroll,R. J. Gray,N. Booth,M. Burza,M. P. Desjarlais,F. Du,B. Gonzalez-Izquierdo,D. Neely,H. W. Powell,A. P. L. Robinson,D. R. Rusby,G. G. Scott,X. H. Yuan,C. -G. Wahlstrom,P. Mckenna
DOI: https://doi.org/10.1103/physrevlett.111.095001
IF: 8.6
2013-01-01
Physical Review Letters
Abstract:Fast electron transport in Si, driven by ultraintense laser pulses, is investigated experimentally and via 3D hybrid particle-in-cell simulations. A transition from a Gaussian-like to an annular fast electron beam profile is demonstrated and explained by resistively generated magnetic fields. The results highlight the potential to completely transform the beam transport pattern by tailoring the resistivity-temperature profile at temperatures as low as a few eV.